Advantages of Fluorine Introduction in Boron Implanted...

  • Main
  • Advantages of Fluorine Introduction in...

Advantages of Fluorine Introduction in Boron Implanted Shallow p+/n-Junction Formation

K. Ohyu, T. Itoga, N. Natsuaki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
1990
DOI:
10.1143/JJAP.29.457
File:
PDF, 778 KB
1990
Conversion to is in progress
Conversion to is failed