New Etching System with a Large Diameter Using Electron...

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New Etching System with a Large Diameter Using Electron Beam Excited Plasma

M. Ryoji, T. Hara, K. Ohnishi, M. Hamagaki, Y. Dake, M. Tohkai, Y. Aoyagi
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Year:
1992
DOI:
10.1143/JJAP.31.4357
File:
PDF, 1.02 MB
1992
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