On the mechanism of polytetrafluoroethylene ablation using...

Applied Surface Science 2001 Vol. 183; Iss. 3-4

On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process

Hisao Nagai, Muneto Inayoshi, Masaru Hori, Toshio Goto, Mineo Hiramatsu
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Volume:
183
Year:
2001
Language:
english
Pages:
6
DOI:
10.1016/s0169-4332(01)00592-x
File:
PDF, 181 KB
english, 2001
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