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Comprehensive Modeling of Threshold Voltage Variability Induced by Plasma Damage in Advanced Metal–Oxide–Semiconductor Field-Effect Transistors
K. Eriguchi, Y. Nakakubo, A. Matsuda, M. Kamei, Y. Takao, K. OnoYear:
2010
Language:
english
DOI:
10.1143/JJAP.49.04DA18
File:
PDF, 317 KB
english, 2010