Trade-Off Relationship between Si Recess and Defect Density Formed by Plasma-Induced Damage in Planar Metal–Oxide–Semiconductor Field-Effect Transistors and the Optimization Methodology
K. Eriguchi, Y. Nakakubo, A. Matsuda, M. Kamei, Y. Takao, K. OnoYear:
2011
Language:
english
DOI:
10.1143/JJAP.50.08KD04
File:
PDF, 850 KB
english, 2011