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Time evolution of interface roughness during thermal oxidation on Si(0 0 1)
Yuji Takakuwa, Fumiaki Ishida, Takuo KawawaVolume:
190
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0169-4332(01)00836-4
File:
PDF, 136 KB
english, 2002