Thermodynamical computation and physicochemical...

Applied Surface Science 2002 Vol. 193; Iss. 1-4

Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition

Z Sassi, K Chafik, J.C Bureau, A Glachant, B Balland
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Volume:
193
Year:
2002
Language:
english
Pages:
10
DOI:
10.1016/s0169-4332(01)01030-3
File:
PDF, 177 KB
english, 2002
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