Fluorine surface concentration change during the...

Fluorine surface concentration change during the argon–oxygen ion treatment of porous silicon

B.M. Kostishko, S.V. Appolonov, A.E. Kostishko
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Volume:
189
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0169-4332(02)00010-7
File:
PDF, 107 KB
english, 2002
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