X-ray photoelectron spectroscopy studies of the effects of...

Applied Surface Science 2002 Vol. 193; Iss. 1-4

X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

Liudi Jiang, A.G Fitzgerald, M.J Rose, R Cheung, B Rong, E van der Drift
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Volume:
193
Year:
2002
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(02)00225-8
File:
PDF, 103 KB
english, 2002
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