Atomic layer deposition of TiO2 thin films from TiI4 and...

Applied Surface Science 2002 Vol. 193; Iss. 1-4

Atomic layer deposition of TiO2 thin films from TiI4 and H2O

Jaan Aarik, Aleks Aidla, Teet Uustare, Kaupo Kukli, Väino Sammelselg, Mikko Ritala, Markku Leskelä
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Volume:
193
Year:
2002
Language:
english
Pages:
10
DOI:
10.1016/s0169-4332(02)00497-x
File:
PDF, 281 KB
english, 2002
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