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Investigating oxygen flooding at oblique 2 and 1 keV oxygen sputtering for microelectronics support applications
F. Jahnel, R. von CriegernVolume:
203-204
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0169-4332(02)00677-3
File:
PDF, 89 KB
english, 2003