Atomistic simulations of surface coverage effects in anisotropic wet chemical etching of crystalline silicon
M.A Gosálvez, A.S Foster, R.M NieminenVolume:
202
Year:
2002
Language:
english
Pages:
23
DOI:
10.1016/s0169-4332(02)00903-0
File:
PDF, 1.01 MB
english, 2002