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Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering
R.J. Hong, X. Jiang, B. Szyszka, V. Sittinger, A. PflugVolume:
207
Year:
2003
Language:
english
Pages:
10
DOI:
10.1016/s0169-4332(02)01525-8
File:
PDF, 376 KB
english, 2003