New technique to characterise thin oxide films under...

Applied Surface Science 2003 Vol. 212-213; Iss. none

New technique to characterise thin oxide films under electronic irradiation

J. Liébault, K. Zarbout, D. Moya-Siesse, J. Bernardini, G. Moya
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Volume:
212-213
Year:
2003
Language:
english
Pages:
6
DOI:
10.1016/s0169-4332(03)00063-1
File:
PDF, 355 KB
english, 2003
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