Oxygen radical treatment applied to ferroelectric thin...

Applied Surface Science 2003 Vol. 216; Iss. 1-4

Oxygen radical treatment applied to ferroelectric thin films

Ichirou Takahashi, Hiroyuki Sakurai, Atsuhiko Yamada, Kiyoshi Funaiwa, Kentarou Hirai, Shinichi Urabe, Tetsuya Goto, Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi
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Volume:
216
Year:
2003
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(03)00424-0
File:
PDF, 361 KB
english, 2003
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