Nanoscale silicon prepared on different substrates using...

Applied Surface Science 2003 Vol. 217; Iss. 1-4

Nanoscale silicon prepared on different substrates using electron-beam evaporation and their field-emission property

Xinyun Xie, Qing Wan, Weili Liu, Chuanling Men, Qing Lin, Chenglu Lin
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Volume:
217
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0169-4332(03)00561-0
File:
PDF, 197 KB
english, 2003
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