Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
X. Li, W.D. Goodhue, C. Santeufeimio, T.G. Tetreault, R. MacCrimmon, L.P. Allen, D. Bliss, K. Krishnaswami, C. SungVolume:
218
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0169-4332(03)00681-0
File:
PDF, 389 KB
english, 2003