Comparison between post-irradiation annealing and post-high...

Applied Surface Science 2003 Vol. 220; Iss. 1-4

Comparison between post-irradiation annealing and post-high electric field stress annealing of n-channel power VDMOSFETs

Goran S. Ristić, Momčilo M. Pejović, Aleksandar B. Jakšić
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Volume:
220
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(03)00818-3
File:
PDF, 100 KB
english, 2003
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