The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition
J. Červenka, M. Ledinský, J. Stuchlík, H. Stuchlíková, S. Bakardjieva, K. Hruška, A. Fejfar, J. KočkaYear:
2010
Language:
english
DOI:
10.1088/0957-4484/21/41/415604
File:
PDF, 1016 KB
english, 2010