Excimer laser induced chlorine etching of Si patterns for microelectronics
H. Baumgärtner, W. Jiang, I. EiseleVolume:
106
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(96)00386-8
File:
PDF, 353 KB
english, 1996