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Growth kinetics of nanoscale SiO2 layer in a nitric oxide (NO) ambient
Hisashi Fukuda, Noboru Koyama, Toshiaki Endoh, Shigeru NomuraVolume:
113-114
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(96)00803-3
File:
PDF, 501 KB
english, 1997