Growth kinetics of nanoscale SiO2 layer in a nitric oxide...

Growth kinetics of nanoscale SiO2 layer in a nitric oxide (NO) ambient

Hisashi Fukuda, Noboru Koyama, Toshiaki Endoh, Shigeru Nomura
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
113-114
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(96)00803-3
File:
PDF, 501 KB
english, 1997
Conversion to is in progress
Conversion to is failed