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Structural properties of poly-Si deposited by rf glow discharge using 100% SiH4
Ahalapitiya Hewage Jayatissa, Tomuo Yamaguchi, Yoichiro Nakanishi, Kenji Ishikawa, Yoshinori HatanakaVolume:
113-114
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(96)00822-7
File:
PDF, 424 KB
english, 1997