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Impact of nitrogen concentration profile in silicon oxynitride films on stress-induced leakage current
Tomiyuki Arakawa, Ryoichi MatsumotoVolume:
113-114
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(96)00940-3
File:
PDF, 393 KB
english, 1997