In situ FT-IR reflective absorption spectroscopy for...

In situ FT-IR reflective absorption spectroscopy for characterization of SiO2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma

Katsuhiko Furukawa, Yichun Liu, Dawei Gao, Hiroshi Nakashima, Kiichiro Uchino, Katsunori Muraoka
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Volume:
121-122
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(97)00294-8
File:
PDF, 314 KB
english, 1997
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