"Fast" and "thick" e-beam resists exposed with multi-beam tool at 5 keV for implants and mature nodes: experimental and simulated model study
D. J. Resnick, C. Bencher, A. Fay, N. A. Thiam, M. Cordini, I. Servin, C. Constancias, L. Lattard, L. PainLanguage:
english
DOI:
10.1117/12.2085832
File:
PDF, 1.72 MB
english