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Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application
J. E. Rudisill, A. Dupparre, S. Schroeder, G. J. Exarhos, A. H. Guenther, N. Kaiser, K. L. Lewis, M. J. Soileau, C. J. StolzLanguage:
english
DOI:
10.1117/12.584743
File:
PDF, 1.18 MB
english