Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray...

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Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application

D. H. Malueg, M. Khan, F. Cerrina, J. W. Taylor
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Year:
2004
Language:
english
DOI:
10.1143/JJAP.43.3722
File:
PDF, 151 KB
english, 2004
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