Developing novel photoresists: microstructuring of triazene...

Developing novel photoresists: microstructuring of triazene containing copolyester films

Ch Hahn, Th Kunz, U Dahn, O Nuyken, A Wokaun
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Volume:
127-129
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0169-4332(97)00764-2
File:
PDF, 760 KB
english, 1998
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