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Influence of the deposition parameters on the chemical composition of reactively rf sputtered TiO2 on Si
P. Alexandrov, J. Koprinarova, D. TodorovVolume:
115
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(97)80195-x
File:
PDF, 581 KB
english, 1997