Improved thermal stability of ultrathin silicon oxynitride layer due to nitrogen incorporation at the interface
Kuniyil Prabhakaran, Yoshihiro Kobayashi, Toshio OginoVolume:
130-132
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(98)00047-6
File:
PDF, 123 KB
english, 1998