Electronic characterization of Si/SiO2 structure using...

Applied Surface Science 1998 Vol. 130-132; Iss. none

Electronic characterization of Si/SiO2 structure using photo-CVD SiO2 thin film on atomically flat Si substrate

Osamu Maida, Hideaki Yamamoto, Norio Okada, Takeshi Kanashima, Masanori Okuyama
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
130-132
Year:
1998
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(98)00053-1
File:
PDF, 1.55 MB
english, 1998
Conversion to is in progress
Conversion to is failed