Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
Shin Yokoyama, Norihiko Ikeda, Kouji Kajikawa, Yoshimitsu NakashimaVolume:
130-132
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(98)00083-x
File:
PDF, 210 KB
english, 1998