Atomic-layer selective deposition of silicon nitride on...

Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces

Shin Yokoyama, Norihiko Ikeda, Kouji Kajikawa, Yoshimitsu Nakashima
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Volume:
130-132
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(98)00083-x
File:
PDF, 210 KB
english, 1998
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