Chemical etching of thin SiOxCyHz films by post-deposition...

Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma

C Vallée, A Granier, K Aumaille, C Cardinaud, A Goullet, N Coulon, G Turban
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Volume:
138-139
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(98)00387-0
File:
PDF, 513 KB
english, 1999
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