Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma
C Vallée, A Granier, K Aumaille, C Cardinaud, A Goullet, N Coulon, G TurbanVolume:
138-139
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(98)00387-0
File:
PDF, 513 KB
english, 1999