Structural and electrical properties of Ta–Al thin films by...

Applied Surface Science 1999 Vol. 144-145; Iss. none

Structural and electrical properties of Ta–Al thin films by magnetron sputtering

Dong-Sing Wuu, Chia-Chi Chan, Ray-Hua Horng, Wei-Chung Lin, S.L Chiu, Y.Y Wu
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Volume:
144-145
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0169-4332(98)00817-4
File:
PDF, 111 KB
english, 1999
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