Atomic layer epitaxy of copper: an ab initio investigation...

Applied Surface Science 1999 Vol. 148; Iss. 1-2

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process: II. Reaction energies

Per Mårtensson, Karin Larsson, Jan-Otto Carlsson
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Volume:
148
Year:
1999
Language:
english
Pages:
8
DOI:
10.1016/s0169-4332(99)00141-5
File:
PDF, 476 KB
english, 1999
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