The effect of boron ion implantation and annealing on the...

Applied Surface Science 1999 Vol. 150; Iss. 1-4

The effect of boron ion implantation and annealing on the microstructure and electrical characteristics of the diamond films

Hong-Xia Zhang, Ying-Bing Jiang, Q.-B Meng, Yun-Jie Fei, Pei-Ran Zhu, Zhangda Lin, Ke-an Feng
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Volume:
150
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0169-4332(99)00153-1
File:
PDF, 517 KB
english, 1999
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