Nitride film deposition by femtosecond and nanosecond laser...

Applied Surface Science 2000 Vol. 154-155; Iss. none

Nitride film deposition by femtosecond and nanosecond laser ablation in low-pressure nitrogen discharge gas

Z Zhang, P.A VanRompay, J.A Nees, R Clarke, X Pan, P.P Pronko
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Volume:
154-155
Year:
2000
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(99)00381-5
File:
PDF, 1.55 MB
english, 2000
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