Enlargement of “location controlled” Si grains by dual-beam...

Enlargement of “location controlled” Si grains by dual-beam excimer-laser with bump structures

A Burtsev, R Ishihara
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Volume:
154-155
Year:
2000
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(99)00439-0
File:
PDF, 340 KB
english, 2000
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