Atomistic comparative study of VUV photodeposited silicon nitride on InP(100) by simulation and atomic force microscopy
J. Flicstein, E. Guillonneau, J. Marquez, L.S. How Kee Chun, D. Maisonneuve, C. David, Zh. Wang, J.F. Palmier, J.L. CourantVolume:
154-155
Year:
2000
Language:
english
Pages:
8
DOI:
10.1016/s0169-4332(99)00452-3
File:
PDF, 369 KB
english, 2000