Atomic layer epitaxy of copper: an ab initio investigation...

Applied Surface Science 2000 Vol. 157; Iss. 1-2

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process: III. Reaction barriers

Per Mårtensson, Karin Larsson, Jan-Otto Carlsson
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Volume:
157
Year:
2000
Language:
english
Pages:
9
DOI:
10.1016/s0169-4332(99)00519-x
File:
PDF, 674 KB
english, 2000
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