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Optimization of Stress Memorization Technique for 45 nm Complementary Metal–Oxide–Semiconductor Technology
E. Morifuji, A. Eiho, T. Sanuki, M. Iwai, F. MatsuokaYear:
2009
Language:
english
DOI:
10.1143/JJAP.48.031203
File:
PDF, 278 KB
english, 2009