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Analysis of Hot Carrier Degradation of Lateral Double-Diffused Metal–Oxide–Semiconductor under Gate Pulse Stress
K. Furuya, T. Nitta, T. Katayama, K. Hatasako, T. Kuroi, S. MaegawaYear:
2010
Language:
english
DOI:
10.1143/JJAP.49.04DP12
File:
PDF, 317 KB
english, 2010