Characterization of Chemically Vapor Deposited Silicon...

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Characterization of Chemically Vapor Deposited Silicon Nitride Films from Disilane and Ammonia

R. Henda, L. Laanab, Emmanuelscheid, R. Fourmeaux
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Year:
1995
DOI:
10.1143/JJAP.34.L437
File:
PDF, 588 KB
1995
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