Effect of Oxygen Impurities on Thermal Diffusivity of AlN Thin Films Deposited by Reactive RF Magnetron Sputtering
T. Yagi, N. Oka, T. Okabe, N. Taketoshi, T. Baba, Y. ShigesatoYear:
2011
Language:
english
DOI:
10.1143/JJAP.50.11RB01
File:
PDF, 472 KB
english, 2011