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Electrical Characterization of Metal–Insulator–Metal Capacitors with Atomic-Layer-Deposited HfO 2 Dielectrics for Radio Frequency Integrated Circuit Application
Yu-Jian, Huang, Yue, Huang, Shi-Jin, Ding, Wei, Zhang, Ran, LiuVolume:
24
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/24/10/063
Date:
October, 2007
File:
PDF, 330 KB
english, 2007