Fault-tolerant sub-lithographic design with rollback...

Nanotechnology 2008 / 03 Vol. 19; Iss. 11

Fault-tolerant sub-lithographic design with rollback recovery

Naeimi, Helia, DeHon, André
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Volume:
19
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/19/11/115708
Date:
March, 2008
File:
PDF, 659 KB
english, 2008
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