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Nanoscale patterning of silicon dioxide thin films by catalyzed HF vapor etching
Allgair, J, Ryan, J M, Song, H J, Kozicki, M N, Whidden, T K, Ferry, D KVolume:
7
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/7/4/008
Date:
December, 1996
File:
PDF, 288 KB
english, 1996