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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Optimum pre-pulsing and target geometry of LPP for efficient EUV and BEUV sources
Wood, Obert R., Panning, Eric M., Sizyuk, Tatyana, Hassanein, AhmedVolume:
9422
Year:
2015
Language:
english
DOI:
10.1117/12.2085892
File:
PDF, 1.03 MB
english, 2015