SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Application of high-refractive index fluid to KrF-immersion lithography
Yada, Yuji, Ito, Koji, Yamaguchi, Yoshikazu, Furukawa, Taiichi, Miyamatsu, Takashi, Wang, Yong, Hieda, Katsuhiko, Shimokawa, Tsutomu, Lin, QinghuangVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655983
File:
PDF, 379 KB
english, 2006