Deposition of Si-Doped Al Film by Reactive Sputtering

Deposition of Si-Doped Al Film by Reactive Sputtering

Fukuyama, Toshihiko, Yanagisawa, Shintaro
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Volume:
18
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.18.987
Date:
May, 1979
File:
PDF, 211 KB
1979
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